Air Liquide to invest over $250 MM in new high-purity industrial gas plant

  • The new $250-MM plant will supply ultra-pure nitrogen and other gases to Micron Technology, Inc. and other customers in the area. 

Air Liquide will build a new industrial gas production facility in the U.S. to supply the new fab of one of the world’s leading semiconductor manufacturers. In the framework of a long-term contract, the plant will provide large volumes of high-purity industrial gases for the production of memory chips. Air Liquide will invest over $250 MM in this state-of-the art production unit.

Air Liquide will build, own and operate a new industrial gas production facility in Idaho which will produce large volumes of ultra-pure nitrogen and other gases for Micron Technology, Inc., as well as for other customers of the area. This investment will bring hundreds of direct and indirect jobs to Idaho during construction and operation, and the facility is expected to be operational by the end of 2025.

This innovative plant is part of a complete Carrier Gas solution designed by Air Liquide for large customers, with an optimized land footprint and total cost of ownership. The use of digital technologies, standardization and modularization will bring exceptional value to local customers in terms of reliability, short delivery time and efficient project execution.

This project is a concrete example of how Air Liquide is contributing to technological progress while optimizing the semiconductor sector’s environmental footprint. The advanced design of this next generation high efficiency Carrier Gas Facility, produces the full range of critical gases required on site with reduced energy and logistics requirements. The new production unit is 5% more power efficient than the previous generation plants. Producing most of the gases onsite will also avoid transporting them by trucks. In addition, the electricity for the facility is targeted to be 100% from renewable sources within the next five years.


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